Study of Photovoltage Decays in Nanostructured Ge/Si
- Author(s)
- O. Korotchenkov, A. Nadtochiy, V. Schlosser
- Abstract
Motivated by the importance of the oxidized silicon layers, we have
studied the surface photovoltage (SPV) transients in nanoislands of GexSi1x
on silicon and oxidized Si surfaces. It is shown that the SPV decays
can be approximated by the stretched-exponential form, with the β
values ranging from 0.3 to 0.6 for the islands grown on oxide-covered
Si substrates and from 0.5 to 1 for the ones placed on bare Si. On this
basis, a simple qualitative model is proposed that takes into account a
donor-and acceptor-like interface states at the GeSi/SiO2 and Si/SiO2
interface, which act as recombination centers with densities dependent
on the GeSi coverage. These results can be used to improve the
functionality of photoelectric devices based on Ge/Si.
- Organisation(s)
- Electronic Properties of Materials
- External organisation(s)
- Taras Shevchenko National University of Kyiv (KNU)
- Pages
- 406-411
- No. of pages
- 6
- DOI
- https://doi.org/10.4028/www.scientific.net/SSP.205-206.406
- Publication date
- 2014
- Peer reviewed
- Yes
- Austrian Fields of Science 2012
- 103020 Surface physics, 103018 Materials physics, 103009 Solid state physics
- Keywords
- ASJC Scopus subject areas
- Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Materials Science(all)
- Portal url
- https://ucrisportal.univie.ac.at/en/publications/study-of-photovoltage-decays-in-nanostructured-gesi(f7ae4266-b660-47f1-80c6-3283bcb91cdd).html