Rising Speed Limits for Fluxons via Edge-Quality Improvement in Wide MoSi Thin Films
- Author(s)
- Barbora Budinská, B. Aichner, D. Yu Vodolazov, M. Yu Mikhailov, F. Porrati, M. Huth, A. V. Chumak, W. Lang, O. V. Dobrovolskiy
- Organisation(s)
- Nanomagnetism and Magnonics, Electronic Properties of Materials
- External organisation(s)
- Russian Academy of Sciences, National Academy of Sciences of Ukraine (NASU), Johann Wolfgang Goethe-Universität Frankfurt am Main
- Journal
- Physical Review Applied
- Volume
- 17
- No. of pages
- 12
- ISSN
- 2331-7019
- DOI
- https://doi.org/10.1103/PhysRevApplied.17.034072
- Publication date
- 03-2022
- Peer reviewed
- Yes
- Austrian Fields of Science 2012
- 103033 Superconductivity, 103018 Materials physics
- Keywords
- ASJC Scopus subject areas
- Physics and Astronomy(all)
- Portal url
- https://ucrisportal.univie.ac.at/en/publications/rising-speed-limits-for-fluxons-via-edgequality-improvement-in-wide-mosi-thin-films(ce434ff3-eb9b-4666-8c70-61e46995bbe7).html