Rising Speed Limits for Fluxons via Edge-Quality Improvement in Wide MoSi Thin Films

Author(s)
Barbora Budinská, B. Aichner, D. Yu Vodolazov, M. Yu Mikhailov, F. Porrati, M. Huth, A. V. Chumak, W. Lang, O. V. Dobrovolskiy
Organisation(s)
Nanomagnetism and Magnonics, Electronic Properties of Materials
External organisation(s)
Russian Academy of Sciences, National Academy of Sciences of Ukraine (NASU), Johann Wolfgang Goethe-Universität Frankfurt am Main
Journal
Physical Review Applied
Volume
17
No. of pages
12
ISSN
2331-7019
DOI
https://doi.org/10.1103/PhysRevApplied.17.034072
Publication date
03-2022
Peer reviewed
Yes
Austrian Fields of Science 2012
103033 Superconductivity, 103018 Materials physics
Keywords
ASJC Scopus subject areas
Physics and Astronomy(all)
Portal url
https://ucris.univie.ac.at/portal/en/publications/rising-speed-limits-for-fluxons-via-edgequality-improvement-in-wide-mosi-thin-films(ce434ff3-eb9b-4666-8c70-61e46995bbe7).html